The proposed method uses a shift register for the alternation and variation of the metal-layer data, and the inter-connection area is removed to minimize the ...

The reversal of a silicon chip to find out its security structure is common and possible at the present time. Thanks to reversing, it is possible to use a ...

To resolve this issue, this paper proposes a practical silicon-surface- protection method using a metal layer that increases the security level of the chip ...

To resolve this issue, this paper proposes a practical silicon-surface-protection method using a metal layer that increases the security level of the chip while ...

This paper proposes a practical silicon-backside-protection method that can protect the IC from backside attacks while minimizing its size and increasing its ...

Jul 18, 2023 ¡¤ Atomic layer deposition (ALD) is a thin-film deposition technique that allows precise control over the thickness and composition of deposited ...

These advanced coatings have the capability to elevate the electrochemical impedance values of steel by 2-3 orders of magnitude compared to the blank coating.

Both preliminary and final tungsten metal layers are deposited preferably via chemical vapor deposition using the WF 6 and SiH 4 as reactants.

May 2, 2022 ¡¤ A deep etching method for silicon ¡°micro¡±structures was successfully developed. This wet etching process is based on metal-assisted chemical etching (MACE).

Feb 4, 2021 ¡¤ In this review, various practical considerations for platinum (Pt) metallization on both Si and SiO 2 are placed in context with a comprehensive data review of ...